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Micro / Nano pattern research Roll imprint process research Equipment holding
Micro / Nano pattern research
Micro / Nano pattern research Roll imprint process research Equipment holding

Micro / Nano pattern research

Home   >   R&D   >  Micro / Nano pattern research

Research development process

  • 3 dimensional cylinder mold PR coating and E-beam lithography direct exposure process technology research for new market entry and technology commercialization plan through seconds precision cylinder mold direct exposure process
  • Photo mask manufacturing through planar exposure process technology as well as 3 dimensional cylinder mold

  • 01 The primary processing for cylinder mold

  • 02 Ni-P plating

  • 03 The secondary processing for cylinder mold(Mirror polishing)

  • 04 cylinder mold Cr deposition

  • 05 cylinder mold photosensitive agent coating

  • 06 Pattern formation by using e-beam